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portada Machine Learning-Based Modelling in Atomic Layer Deposition Processes
Type
Physical Book
Publisher
Author
Language
English
Pages
376
Format
Paperback
ISBN13
9781032386706
Edition No.
1

Machine Learning-Based Modelling in Atomic Layer Deposition Processes

Oluwatobi Adeleke|Sina Karimzadeh|Tien-Chien Jen (University Of Johannesburg South Africa) (Author) · Crc Press · Paperback

Machine Learning-Based Modelling in Atomic Layer Deposition Processes - Oluwatobi Adeleke|Sina Karimzadeh|Tien-Chien Jen (University Of Johannesburg South Africa)

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Synopsis "Machine Learning-Based Modelling in Atomic Layer Deposition Processes"

This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.

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